The EpiSoft control system comprises the EpiCAD software package integrated with the ControlFrame hardware interface unit.

EpiCAD is a modular, real-time, multi-tasking environment that integrates all the control, monitoring and support facilities needed to realise the full potential of any MBE system. It communicates with the deposition system via the ControlFrame interface unit. The EpiCAD/ControlFrame combination offers unprecedented flexibility, user-configurability and proofing against anything that can come up in the future.

Many of EpiCAD's powerful features were developed to address user requirements, and in response to their comments and suggestions; as such, EpiCAD draws on your experience and expertise.

Key Features

• Technologies: All solid and gas MBE. Includes e-beam, MOMBE, CBE...
• Material Systems: III-Vs, nitrides, GeSiC, CMT, Metals, HTSC. From research to production!
• System Compatibility: Flexible modular approach ensures compatibility with ALL commercial and "special" MBE systems.
• User Configurable. Unlimited hardware and software expansion for process, vacuum and mechanical system interface. All aspects are user configurable.
• Structure-Oriented Control. SOC allows you to interact with the system in terms of composition, growth rates, doping levels, thickness etc. - you design your "recipes" in an event-based fashion, just as you would draw the structure.
  ~ Intuitive to use in "manual" and "recipe" modes.
  ~ Revolutionises "recipe" creation, editing and execution. No need to perform parameter calculations;
  EpiCAD does it all at run-time.
  ~ Calibration independent: re-run recipes without rewriting to use new calibrations
  ~ Ease of interpretation.
  ~ True source consumption records simplify calibration and maintenance scheduling.
• Calibration Maintenance removes the guess work from source calibration.
  ~ Wide range of fitting functions (lin, log, vapour pressure, quadratics, look-up tables etc.)
  ~ Intuitive. Simple data editing and data weighting.
  ~ Curve Shift and Curve Tilt facilitates fast, accurate recalibration.
  ~ Auto-Correction can automatically correct for material consumption effects during long growths.
• EpiList "recipe" editor.
  ~ Layer/event-based on thickness, composition, doping etc.
  ~ Unlimited recipe size.
  ~ Repeat sequence to 999 repeats; nesting to 9 levels.
  ~ Edit recipe whilst running.
  ~ Multi-step editor allows "global" editing.
• Data Logging of all process and system parameters.
  ~ Graphical data presentation of composition, pressure, temperature, etc. with data "zoom".
  ~ Data capture facility for RHEED/IGFM measurements.
• Wide range of unique features:
  ~ Substrate HotSetpoint facility for rapid correction of substrate temperature during growth.
  ~ Dual sensor control (e.g. substrate control switching between pyrometer and thermocouple).
  ~ Comprehensive alarm conditions/actions protect system and sources.
  ~ Multi-tasking allowing recipes to be edited, data to be reviewed, etc. etc even during recipe execution.
  ~ Editing and changes to the executing recipe.
  ~ Process Loop slaving for automation of secondary heaters/support controllers.
  ~ Multi-ramp/soak system bake-out control and source control.
  ~ System mimic. Wafer tracking. Degas control ... AND MUCH MORE!!

To view "Three steps to perfect composition ramp control" click here.